Welcome to the World of Grayfield Optical Inc.
SeeNano optical microscopes: White light source, no oil immersion, variable extended depth-of-field, color contrast.
Important News: Change of product lines at Grayfield Optical, Inc.
Update: Febuary 10, 2019
Thanks to everyone waiting patiently for news. We have been looking hard at the best way of offering our technology on the market and are now working on an exciting new product that will be available in mid 2019. It will make our microscope system much more affordable and more universally available.
Our engineers are working hard on finally getting the new microscopes ready, after a number of unavoidable setbacks and delays including illness and funding issues. There are some minor design and testing issues to be resolved, yet we now plan to provide more details about the new systems in April and they will become available to order in mid 2019. The engineering work was difficult as we wanted to get the pricing down to acceptable levels without sacrificing quality. At the same time we are adding options for computer controlled imaging and much more.
Our SeeNano microscopes are now in the final stages of development and they will have all the capabilities of the previous series, while adding fluorescence capabilities and realistic pricing. We do not expect any further delays.
Unsatisfied with the capabilities of existing light microscopes, it was decided to investigate why the resolution, color contrast and depth of field is so limited. This research led to the discovery of a unique new way of building microscopes which no longer suffered many of the constraints of existing optical theory. We found that by using a different approach to optics and a new mathematical approach, we could build microscopes with a large "cylinder of sharpness" (depth of field) and a true resolution of 100nm, while maintaining full contour sharpness and true colors without the need for staining, oil immersion, etc. This Grayfield Lens System is the basis of all our future optical systems.
The GLS technology has also been used to develop objectives for extreme image reduction, a quantum leap in the nano lithography of critical dimensions that can be used for computer wafer production.