Welcome to the World of Grayfield Optical Inc.
SeeNano optical microscopes: White light source, no oil immersion, variable extended depth-of-field, color contrast.
Important News: Change of product lines at Grayfield Optical, Inc.
Update: July 17, 2017
Thanks to everyone waiting patiently for news. We have been looking hard at the best way of offering our technology on the market and are now working on an exciting new product that will be available later this year. It will make our microscope system much more affordable and more universally available.
We will be announcing more about this in August, right here. This is probably one of the best and more easier to implement ideas we have worked on for years. If you send us a message via the form below, we will send you an email about the new project in August, when we are ready to announce it.
Our SeeNano microscopes are still in development, but will be delayed while we concentrate on our new concept. They will have all the capabilities of the previous series, while adding fluorescence capabilities and realistic pricing. Development work is progressing well and we have started to get into the costing phase so that we are able to price these new microscopes. We now plan to start releasing the new microscopes in the first quarter of 2018.
Unsatisfied with the capabilities of existing light microscopes, it was decided to investigate why the resolution, color contrast and depth of field is so limited. This research led to the discovery of a unique new way of building microscopes which no longer suffered many of the constraints of existing optical theory. We found that by using a different approach to optics and a new mathematical approach, we could build microscopes with a large "cylinder of sharpness" (depth of field) and a true resolution of 100nm, while maintaining full contour sharpness and true colors without the need for staining, oil immersion, etc. This Grayfield Lens System is the basis of all our future optical systems.
The GLS technology has also been used to develop objectives for extreme image reduction, a quantum leap in the nano lithography of critical dimensions that can be used for computer wafer production.